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Found 1 from your keywords: author=Samukawa, Seiji
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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
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Samukawa, Seiji

This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which…

Edition
1
ISBN/ISSN
978-4-431-54795-2
Collation
viii, 40.: Ill.
Series Title
SpringerBriefs in Applied Sciences and Technology
Call Number
621.044 Sam f